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BSc(Eng) (Bagh) - MSc (Salf) PhD(Sheff) MISES, MIEEE
University of Canterbury
Private Bag 4800
Christchurch
Phone: 03 364 2867 x 7272
Fax: 03 364 2761
maan.alkaisi@canterbury.ac.nz
http://elec.canterbury.ac.nz/research/nest
Research
Interests
Nanofabrications: Development of high resolution low cost fabrication
techniques. Including Near Field Optical Lithography, Phase Shifting Masks
and Nano-Imprint Lithography.
Surface texturing: Employment of dry etching processes for surface texturing of semiconductor materials. Textured surfaces are used as light trapping elements to enhance the efficiency of solar cells.
Selected
Publications
- Mohamed, K., Alkaisi, M.M., Blaikie R.J, “The fabrication of 3D structures for a UV curable nanoimprint (UV-NIL) mold using variable dose control with critical energy electron beam exposure”, J.Vac.Sci.Technol.B 25 (6):2357-2360, Nov (2007).
- Muys, J., Alkaisi, M.M., Evans, J.J.(2006) “Bioimprint: Nanoscale analysis by replication of cellular topography using soft lithography” Journal of Biomedical nanotechnology, Vol 2, No 1, April 2006, pp 11-15.
- Muys, J., Alkaisi, M.M., Evans, J.J. “Cellular replication and AFM imaging using UV-Bioimprint technique”, Nanomedicine: Nanotechnology, biology and Medicine, 2(3) 2006.
- Allen, M.W, Akaisi,M.M, Durbin, S.M., “Metal Schottky diodes on Zn-polar and O-polar bulk ZnO” , Applied Physics letters, 2006, 89(10), 3520.
- Chiu, W.L., Alkaisi, M.M., Kumaravelu, G, Blaikie, R.J. Reeves, “Sub- wavelength texturing for solar cells using Intereferometric Lithography”, Advances in Science and Technology Vol. 51(2006) pp 115-120.
- Alkaisi, M.M. Blaikie, R.J., McNab, S.J., Cheung, R. and Cumming, D.R.S., (1999) “Sub-diffraction-limited pattering using Evanescent near field optical lithography”. Appl.Phy. Lett.75, No.22, 5360, Nov 29. 1999.
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